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Metal-Organic Compound Chemical Vapor Deposition
Model MOCVD-500-A
For Experimental growth of quality epitaxial layers III-V, II-VI compounds. Multi-Layer structures. Directly heated silicon carbide coated, high purity graphite or PBN susceptor. Low mass thermocouple probe immersed into susceptor. Broad temperature and pressure application. Highest quality materials utilized throughout.
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Vapor Concentration Monitor
IR-300 Series
Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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Ozone Gas Generators
SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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High Temperature Absolute Pressure Transducers
Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Liquid Flow Controller
Built upon field proven technology, the Turbo™ Liquid Flow Controller (LFC) 2950 was engineered to pair with MSP Turbo II™ Vaporizers to provide a reliable, high-performance liquid vapor delivery solution for semiconductor thin film deposition processes (including CVD, PECVD, ALD, and MOCVD). The diagram below shows how the LFC fits into the liquid vaporization system MSP offers.
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Matrix Vapor Deposition System
iMLayer
The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Plasma CVD & Reactive Ion Etching System
MODEL DRIE-1100-LL-ECR
The Tek-Vac DRIE-1100-LL-ECR series systems are designed for both high-density plasma chemical vapor deposition and reactive ion etching of sub-micron integrated circuits, optical devices and RF microwave electron devices.
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Physical Vapor Deposition Systems
Physical Vapor Deposition Systems offer maximum flexibility for a wide range of thin film deposition applications with advanced process capabilities, unsurpassed uniformity and multiple deposition modes.
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2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Thin-film deposition
Plasma Source
SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Ion Beam Deposition
Create ultra-precise, high-purity, thin film layer devices with maximum uniformity and repeatability with Ion Beam Deposition (IBD) Systems.
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Vapor Tension Thermometer
RF60A
UEi Test & Measurement Instruments
Farenheit and Celsius scale Vapor Tension thermometer
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Particle Deposition Systems
MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Dynamic Scale Deposition Loop System
Dynamic Scale Deposition Loop fully automated systems includes hardware and software to measure and evaluate the performance of scale inhibitors under high pressure and high temperature conditions.
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Vapor Source Mass Flow Controller With Viscous Choked Flow
The 1150C Vapor Source Mass Flow Controllers are pressure based measurement and control systems designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas using viscous flow through a choked orifice.
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Crude Oil Package for Vapor Pressure
The GRABNER INSTRUMENTS' Crude Oil Package is a comprehensive solution for the transport and measurement of the vapor pressure of crude oil according to ASTM D6377 (Expansion Method). The unique Floating Piston Cylinder allows safe sample transfer of “live crude oils” according to ASTM D3700 and eliminates the risk of evaporation of light hydrocarbon ends during transport. The Grabner Instruments crude oil package is also strictly in accordance with the Russian standard GOST 52340.
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Cold Vapor Atomic Fluorescence (CVAF) Mercury Analyzer
QuickTrace M‑8000
The QuickTrace® M-8000 Cold Vapor Atomic Fluorescence (CVAF) mercury analyzer is ideal for ultra-trace to sub-mg/L mercury quantitation. Due to the high sensitivity of the M-8000, it easily achieves the ultra-trace detection limit of <0.05 ng/L total mercury that is demanded by customers following EPA method 1631. The QuickTrace® M-8000 is also versatile enough to analyze samples >400 µg/L without dilution in a research or industrial setting.
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Vapor Source Mass Flow Controller With Viscous Laminar Flow
The 1152C Vapor Source Mass Flow Controller is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas. The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control.
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Reid Vapor Pressure Analyzers
Increase your gasoline blending profits with process Reid Vapor Pressure measurements and automatic air saturation of the sample.
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Dynamic Vapor Sorption Analyzer
IGAsorp-XT
The IGAsorp-XT is a fully automated water sorption analyzer designed for measurements at temperatures and humidities beyond those available with conventional DVS analyzers. High resolution sorption isotherms are recorded at humidity values from 0.2 %RH or lower, using the unique climate-XT control method. Combined with high temperature water sorption measurements to 300 °C, an integrated pre-heater and completely flexible method programming, the IGAsorp-XT is the world’s most advanced benchtop DVS analyzer.
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Water Vapor Permeability Tester
WPT-304
WPT-304 Water Vapor Permeability Tester is manufactured based on the gravimetric method and is applicable to test the water vapor transmission rate of plastic films, composite films, sheets, and other materials used in packaging, medical and constructive industry.
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Particle Deposition Systems
Sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Vapor Mass Flow Controllers
Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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Dual Vapor Gravimetric Sorption Analyzer
DVS Resolution
DVS Resolution’s key feature is the combined ability to precisely control and measure temperature and relative humidity while recording the highest resolution changes in mass. DVS Resolution uses a dry carrier gas typically nitrogen or compressed air for its operation. Digital mass flow controllers regulate flows of dry and saturated gases. Relative humidity is generated by precisely mixing dry and saturated gas flows in desired flow ratios which produce expected relative humidity. In a typical experiment a known concentration of water vapor is delivered over a sample placed inside the sample pan connected to the Surface Measurement Systems Ultrabalance™ measuring realtime mass changes caused by sorption or desorption of water molecules. Prior to sorption measurements, the sample can be in-situ preheated/dried at temperatures of up to 300oC.
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Water Vapor Sorption Analyzer
DVS Adventure
DVS Adventure is a water vapor sorption analyzer that measures sorption and desorption isotherms over a broad range of humidities and temperatures. It offers unprecedented temperature stability and humidity performance.
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Water Vapor Absorption Tester
DRK854A
Shandong Drick Instruments Co., Ltd.
Used to test the water vapor absorption performance of the sample.
